Display device with clearance

ABSTRACT

A display device is provided, in which view-angle dependence of chromaticity of white or an intermediate color may be reduced. The display device includes a pair of opposed substrates, a light blocking layer provided on one of the pair of substrates while having a plurality of openings, and a plurality of self-luminous elements provided on the other of the pair of substrates, each of the self-luminous elements having an emission region facing each of the openings, and having an emission color different from an emission color of another element, at least one self-luminous element being different from other self-luminous elements in clearance in a display plane direction from an end of the emission region to an opening of the light blocking film.

CROSS REFERENCES TO RELATED APPLICATIONS

This application is a continuation application of, and claims thebenefit of and priority to, U.S. patent application Ser. No. 12/849,912,filed on Aug. 4, 2010, which claims priority to Japanese Priority PatentApplication JP 2009-189445, filed in the Japanese Patent Office on Aug.18, 2009, the entire contents of each of which are hereby incorporatedby reference.

BACKGROUND

The present application relates to a display device having self-luminouselements such as organic EL (Electroluminescence) elements or inorganicEL elements.

In the display device using self-luminous elements such as organic ELelements, the self-luminous elements are provided on one of a pair ofsubstrates, and a light blocking black matrix is provided on the other(for example, see Japanese Patent Application, Publication No.2006-73219). In such a previous full-color display device, white or anintermediate color is displayed by mixing colors of emission light frommonochromatic self-luminous elements.

SUMMARY

However, such a previous display device has had a difficulty that when aview angle characteristic is varied between colors, white balance isdisrupted, and therefore chromaticity of white or and intermediate coloris changed depending on view angles. A major cause of difference in viewangle characteristic between colors includes use of a resonator effector an interference effect for improving light extraction efficiency, ora dimension of an emission region varied between colors for compensatingdisruption of luminance balance due to aging.

It is desired to provide a display device in which view-angle dependenceof chromaticity of white or an intermediate color may be reduced.

A display device according to an embodiment has the following components(A) to (C):

(A) a pair of opposed substrates;

(B) a light blocking film provided on one of the pair of substrateswhile having a plurality of openings; and

(C) a plurality of self-luminous elements provided on the other of thepair of substrates, each element having an emission region facing eachof the openings, and having an emission color different from that ofanother element, where at least one element is different from otherelements in clearance in a display plane direction from an end of theemission region to an opening of the light blocking film.

In the display device according to the embodiment, the plurality ofself-luminous elements emit monochromatic light different in color fromone another, and white or an intermediate color is displayed by mixingcolors of the monochromatic light.

In such a case, when the plurality of self-luminous elements are viewedin an oblique direction, a shadow portion is formed by the lightblocking film. If the shadow portion overlaps with an emission region ofa self-luminous element, such an overlapped portion becomes a lightblocked region where emitted light is shaded by the light blocking film,and luminance is thus decreased in accordance with area of the lightblocked region.

In the display device, since at least one self-luminous element isdifferent in clearance from another element in a display plane directionfrom an end of the emission region to an opening of the light blockingfilm, the self-luminous element is different in ratio of light blockingarea to emission region area from other self-luminous elements, and thusdifferent from other elements in level of luminance reduction due tolight blocking of the light blocking film. In this way, a level ofluminance reduction due to light blocking of the light blocking film isvaried between colors. Thus, when difference in view anglecharacteristic exists between colors, such difference may be reduced,and consequently change in chromaticity depending on view angles ofwhite or an intermediate color may be suppressed.

In the display device according to the embodiment, since at least oneself-luminous element is made different from another self-luminouselement in clearance in a display plane direction from an end of theemission region to an opening of the light blocking film, difference inview angle characteristic between colors is reduced by using reductionin luminance due to light blocking of the light blocking film, andconsequently view-angle dependence of chromaticity of white or anintermediate color may be reduced.

Additional features and advantages are described herein, and will beapparent from the following Detailed Description and the figures.

BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is a plan view showing a configuration of a display deviceaccording to a first embodiment.

FIG. 2 is a plan view showing one pixel of the display device shown inFIG. 1 in an enlarged manner.

FIG. 3 is a section view along a line of the pixel shown in FIG. 2.

FIG. 4 is a plan view showing a pixel according to calculation example 1in an enlarged manner.

FIG. 5 is a section view of the pixel shown in FIG. 4.

FIG. 6 is a graph showing a chromaticity-to-view angle characteristic ofthe pixel shown in FIG. 4.

FIG. 7 is a plan view showing a pixel according to comparative example 1in an enlarged manner.

FIG. 8 is a plan view showing a pixel according to calculation example 2in an enlarged manner.

FIG. 9 is a section view of the pixel shown in FIG. 8.

FIG. 10 is a graph showing a chromaticity-to-view angle characteristicof the pixel shown in FIG. 8.

FIG. 11 is a plan view showing a pixel according to comparative example2 in an enlarged manner.

FIG. 12 is a diagram showing a configuration of the display device shownin FIG. 1.

FIG. 13 is a diagram showing an example of a pixel drive circuit shownin FIG. 12.

FIG. 14 is a section view showing a configuration of an organic ELelement shown in FIG. 12.

FIG. 15 is a section view showing another configuration of the organicEL element shown in FIG. 12.

FIG. 16 is a plan view showing a pixel according to modification 1 in anenlarged manner.

FIG. 17 is a plan view showing a modification of the pixel of FIG. 16.

FIG. 18 is a plan view showing a schematic configuration of a moduleincluding the display device according to the embodiment.

FIG. 19 is a perspective view showing appearance of application example1 of the display device according to the embodiment.

FIGS. 20A and 20B are perspective views, where FIG. 20A shows appearanceof application example 2 as viewed from a front side, and FIG. 20B showsappearance thereof as viewed from a back side.

FIG. 21 is a perspective view showing appearance of application example3.

FIG. 22 is a perspective view showing appearance of application example4.

FIGS. 23A to 23G are views, where FIG. 23A is a front view ofapplication example 5 in an opened state, FIG. 23B is a side viewthereof, FIG. 23C is a front view thereof in a closed state, FIG. 23D isa left-side view thereof, FIG. 23E is a right-side view thereof, FIG.23F is a top view thereof, and FIG. 23F is a bottom view thereof.

DETAILED DESCRIPTION

The present application will be described in detail with reference todrawings according to an embodiment. Description is made in thefollowing sequence.

1. Embodiment

-   -   (1) Description of the principle (example where width of        emission regions are the same between all colors, and a blue        clearance is large compared with that for another color)    -   (2) Calculation example 1 (example where width of emission        regions are the same between all colors, and a blue clearance is        small compared with that for another color)    -   (3) Calculation example 2 (example where width of a blue        emission region is large compared with width of another color        emission region, and a blue clearance is small compared with        that for another color)

2. Modification 1 (example where a clearance is continuously changedwithin one self-luminous element)

3. Application examples

FIG. 1 shows an example of a planar configuration of a display deviceaccording to an embodiment. The display device 1 is used for atelevision apparatus or the like, and has a configuration where aplurality of pixels 10 are arranged, for example, in a matrix in adisplay region 110. Each pixel 10 has, for example, a self-luminouselement 10R emitting red monochromatic-light, a self-luminous element10G emitting green monochromatic-light, and a self-luminous element 10Bemitting blue monochromatic-light. Each of the self-luminous elements10R, 10G and 10B may be configured of not only an organic EL elementdescribed later, but also an inorganic EL element, a semiconductorlaser, or an LED (Light Emitting Diode).

FIG. 2 shows a planar configuration of one of the pixels 10 shown inFIG. 1 in an enlarged manner. The self-luminous elements 10R, 10G and10B have emission regions 11R, 11G and 11B, respectively. A lightblocking film 22 as a black matrix is opposed to boundary portionsbetween the emission regions 11R, 11G and 11B adjacent to one another.

The emission regions 11R, 11G and 11B have, for example, a longitudinalrectangular shape each, where a vertical dimension (hereinafter, calledlength) in a display plane is larger than a horizontal dimension(hereinafter, called width) in the plane. The rectangular shapedescribed herein includes not only a geometrically perfect, rectangularshape but also a substantially rectangular shape despite having a notchcorresponding to under TFT depending on a layout of the under TFT or thelike. The display plane refers to a plane parallel to the paper in FIG.2.

For example, the light blocking film 22 is configured of a black resinfilm mixed with a black colorant, the film having an optical density ofat least 1, or a thin-film filter using interference of light in a thinfilm. The black resin film is preferably used to configure the lightblocking film because the light blocking film may be easily formed atlow cost. The thin-film filter, which is formed by stacking at least oneof thin films including metal, metal nitride, metal oxide or the like,attenuates light by using interference of light in a thin film.Specifically, the thin-film filter includes a filter formed byalternately stacking films of chromium and chromium oxide (III) (Cr₂O₃).

FIG. 3 shows a sectional configuration of the pixel 10. Theself-luminous elements 10R, 10G and 10B are disposed on a firstsubstrate 11, and the light blocking film 22 is disposed on a secondsubstrate 21. The first and second substrates 11 and 21 are configuredof glass, a silicon (Si) wafer, or resin. The first and secondsubstrates 11 and 21 are opposed to each other with the self-luminouselements 10R, 10G and 10B and the light blocking film 22 on the insideof the substrates, respectively, and an intermediate layer 30 includingresin or the like is provided between the substrates as necessary. Thefirst and second substrates 11 and 21 correspond to a specific exampleof “a pair of opposed substrates”.

In this way, the self-luminous elements 10R, 10G and 10B are provided ona substrate different from a substrate of the light blocking film 22.The reason for this is as follows. Sufficient heat resistance andreliability to endure a formation process of the light blocking film 22are necessary for the self-luminous elements 10R, 10G and 10B in orderto form the film 22 on the same substrate 11 as a substrate of theself-luminous elements. However, this is extremely difficult at present.Therefore, the light blocking film 22 is substantially necessary to beprovided on the opposed, second substrate 21. As a result, a gap Gcorresponding to thickness of the intermediate layer 30 is formedbetween the emission regions 11R, 11G and 11B of the self-luminouselements 10R, 10G and 10B on the first substrate 11 and the lightblocking film 22 on the second substrate 21.

A color filter 23 is provided for improving color purity on regions(openings 24 described later) except for the light blocking film 22 onthe second substrate 21. The color filter 23 includes a red filter 23R,a green filter 23G, and a blue filter 23B, which are sequentiallyarranged in correspondence to the emission regions 11R, 11G and 11B. Thered, green or blue filter 23R, 23G and 23B is configured of resin mixedwith a pigment, and is adjusted such that light transmittance is high ina target wavelength range of red, green or blue, and low in otherwavelength ranges by selecting an appropriate pigment.

The intermediate layer 30 includes, for example, a protective layer forprotecting the self-luminous elements 10R, 10G and 10B, and an adhesionlayer (both of them are not shown in FIG. 3, see FIGS. 14 and 15).

As shown in FIGS. 2 and 3, the light blocking film 22 has a plurality ofopenings 24, and the emission regions 11R, 11G and 11B are provided incorrespondence to the openings 24. Length and width of each opening 24is typically larger than length and width of each of the emissionregions 11R, 11G and 11B. The reason for this is to prevent reduction inluminance by light blocking of part of the emission region 11R, 11G or11B by the light blocking film 22 due to shift in position at which thefirst and second substrates 11 and 21 are attached to each other.Therefore, an end of each emission regions 11R, 11G and 11B is separatedfrom openings 24 of the light blocking film 22. Such a separation,namely, a clearance in a display surface direction from the ends of theemission regions 11R, 11G and 11B to the opening 24 of the lightblocking film 22 is expressed as ½(L_(BM)-L_(EL)) (L_(BM) denotes widthof the opening 24, and L_(EM) denotes width of the emission regions 11R,11G and 11B). The display surface refers to a plane perpendicular to apaper in FIG. 3.

In the embodiment, a clearance, ½(L_(BMB)−L_(ELB)), of the self-luminouselement 10B is different from a clearance, ½(L_(BMR)−L_(ELR)) or½(L_(BMG)−L_(ELG)), of another self-luminous elements 10R and 10G. Thisenables reduction in view-angle dependence of chromaticity of white oran intermediate color in the display device 1.

This is described in detail below with reference to FIGS. 2 and 3.

As shown in FIG. 3, in the case that the light blocking film 22 isdisposed on the second substrate 21, when the self-luminous elements10R, 10G and 10B on the first substrate 11 are viewed in an obliquedirection, shadow portions appear by the light blocking film 22. If eachshadow portion overlaps with the emission region 11R, 11G or 11B, suchan overlapped region becomes a light blocked region where emitted lightis blocked by the light blocking film 22, and thus luminance isdecreased depending on width L_(SR), L_(SG) or L_(SB) (hereinafter,called L_(S) as a general term) of the light blocked region. That is,relative luminance Y considering light blocking of the light blockingfilm 22 is given as Y=1−L_(S)/L_(EL).

In the example shown in FIG. 2, while width of the emission regions 11R,11G and 11B are the same between all colors, width L_(BMB) of theopening 24 facing the blue emission region 11B is larger than widthsL_(BMR) and L_(BMG) of the openings 24 facing the red and green emissionregions 11R and 11G. Accordingly, the clearance, ½(L_(BMB)−L_(ELB)), ofthe blue self-luminous element 10B is larger than the clearances,½(L_(BMR)−L_(ELR)) and ½(L_(BMG)−L_(ELG)), of the red and greenself-luminous elements 10R and 10G. These are summarized in numericalexpression 1.

Width of emission region: L _(ELR) =L _(ELG) =L _(ELB)

Width of opening: L _(BMR) =L _(BMG) <L _(BMB)  Numerical expression 1

Size relationship between clearances:

½(L _(BMR) −L _(ELR))=½(L _(BMG) −L _(ELG))<½(L _(BMB) −L _(ELB))

In this case, the light blocked region L_(SB) for blue is small comparedwith the light blocked regions L_(SR) and L_(SG) for red or green aftera shadow of the light blocking film 22 appears in the emission regions11R, 11G and 11B. That is, size relationship between the light blockedregions L_(SR), L_(SG) and L_(SB) is expressed by numerical expression2.

L _(SR) =L _(SG) >L _(SB)  Numerical expression 2

Since the relative luminance Y considering light blocking of the lightblocking film 22 is given as Y=1−L_(S)/L_(EL), magnitude relationshipbetween luminance Y_(R), Y_(G) and Y_(B) of the colors is expressed asnumerical expression 3, and thus luminance of blue is relatively high ata view angle θ_(AIR). Therefore, chromaticity of white is graduallyshifted toward blue with increase in view angle in the case of the pixelshown in FIGS. 2 and 3.

Y _(R) =Y _(G) <Y _(B)  Numerical expression 3

The light blocked region L_(S) is obtained in the following way.

Assuming that a view angle in air is θ_(AIR), a view angle in resinconfiguring the intermediate layer 30 is θ_(RESIN), and a refractiveindex of the resin is n, numerical expression 4 is derived based on theSnell's law.

θ_(RESIN) =a*sin(1/n*sin θ_(AIR))  Numerical expression 4

The light blocked region L_(S) is given by numerical expression 6 basedon the numerical expression 4 and the following numerical expression 5.

L _(S)+½(L _(BM) −L _(EL))=L _(RESIN)*tan θ_(RESIN)  Numericalexpression 5

L _(S) =L _(RESIN)*tan(a*sin(1/n*sin θ_(AIR)))−½(L _(BM) −L_(EL))  Numerical expression 6

Therefore, the width L_(S) of the light blocked region at a resinthickness L_(RESIN) and a view angle θ_(AIR) may be changed for each ofcolors by changing the clearance, ½(L_(BM)−L_(EL)), from an end of theemission regions 11R, 11G and 11B to the opening 24 of the lightblocking film 22.

In the case that width L_(EL)S of the emission regions 11R, 11G and 11Bare fixed, when width L_(BM) of the opening 24 is increased, width L_(S)of the light blocked region is decreased, and conversely, when widthL_(BM) of the opening 24 is decreased, width L_(S) of the light blockedregion is increased. The width L_(BMR), L_(BMG) or L_(BMB) of theopening 24 of the light blocking film 22 is changed, thereby the widthL_(S) of the light blocked region of each color, namely, aluminance-to-view angle ratio may be changed. Theluminance-to-view-angle ratio is changed in such a way, so thatchromaticity of white or an intermediate color including mixture of therelevant colors is changed depending on view angles.

Chromaticity of white is preferably changed depending on view angles forimage quality in the case that the amount of change in chromaticityitself is small, or the case that the chromaticity is changed in adirection along a locus of black-body radiation so that the change inchromaticity is hard to be viewed as color drift. Accordingly, even inthe embodiment, it is desirable that the width L_(S) of the lightblocked region of each color, namely, the clearance, ½(L_(BM)−L_(EL)),is determined such that one or both of the amount of change inchromaticity and a change direction of chromaticity may be improved.

Hereinafter, calculation examples 1 and 2 using specific numericalvalues are described.

Calculation Example 1

FIGS. 4 and 5 show a planar configuration and a sectional configurationof a pixel 10 according to calculation example 1, respectively. In thecalculation example 1, as shown in FIG. 4, while widths of the emissionregions 11R, 11G and 11B are the same between all colors, width L_(BMB)of the opening 24 facing the blue emission region 11B is smaller thanwidths L_(BMR) and L_(BMG) of the openings 24 facing the red and greenemission regions 11R and 11G. Accordingly, the clearance,½(L_(BMB)−L_(ELB)), of the blue self-luminous element 10B is smallerthan the clearances, ½(L_(BMR)−L_(ELR)) and ½(L_(BMG)−L_(ELG)), of thered and green self-luminous elements 10R and 10G. These are summarizedin numerical expression 7.

Width of emission region: L _(ELR) =L _(ELG) =L _(ELB)=60 μm

Width of opening: L _(BMR) =L _(BMG)=76 μm, L _(BMB)=70 μm

Red clearance: ½(L _(BMR) −L _(ELR))=8 μm

Green clearance: ½(L _(BMG) −L _(ELG))=8 μm

Blue clearance: ½(L _(BMB) −L _(ELB))=5 μm  Numerical expression 7

FIG. 6 shows a calculation result of a chromaticity-to-view anglecharacteristic Δu′v′ in the calculation example 1. In such calculation,it is assumed that the first and second substrates 11 and 21 areattached to each other with an intermediate layer 30 including resinhaving a thickness of 20 μm and a refractive index of 1.5.

As a comparative example 1, the chromaticity-to-view anglecharacteristic Δu′v′ is calculated in the same way as in the calculationexample 1 even in the case that width of the opening 24 is assumed to bethe same between all colors (L_(BMR)=L_(BMG)=L_(BMB)=70 μm) as shown inFIG. 7. A result of such calculation is collectively shown in FIG. 6.

As known from FIG. 6, in the calculation example 1, the amount of changein chromaticity Δu′v′ from chromaticity at a view angle θ° is reducedcompared with that in the comparative example 1 in view angles of atleast 30 degrees at which light blocking begins to occur by the lightblocking film 22, showing improvement in chromaticity-to-view anglecharacteristic.

Calculation Example 2

FIGS. 8 and 9 show a planar configuration and a sectional configurationof a pixel 10 according to calculation example 2. In the calculationexample 2, as shown in FIG. 8, width L_(ELB) of the blue emission region11B is larger than widths L_(LER) and L_(LEG) of the red and greenemission regions 11R and 11G. In addition, width L_(BMB) of the opening24 facing the blue emission region 11B is larger than widths L_(BMR) andL_(BMG) of the openings 24 facing the red and green emission regions 11Rand 11G. Accordingly, the clearance, ½(L_(BMB)−L_(ELB)), of the blueself-luminous element 10B is smaller than the clearances,½(L_(BMR)−L_(ELR)) and ½(L_(BMG)−L_(ELG)), of the red and greenself-luminous elements 10R and 10G. These are summarized in numericalexpression 8.

Width of emission region: L _(ELR) =L _(ELG)=50 μm, L _(ELB)=74 μm

Width of opening: L _(BMR) =L _(BMG)=66 μm, L _(BMB)=84 μm

Red clearance: ½(L _(BMR) −L _(ELR))=8 μm

Green clearance: ½(L _(BMG) −L _(ELG))=8 μm

Blue clearance: ½(L _(BMB) −L _(ELB))=5 μm  Numerical expression 8

The reason why width L_(ELB) of the blue emission region 11B is largerthan widths L_(LER) and L_(LEG) of the red and green emission regions11R and 11G in the calculation example 2 is as follows. In theself-luminous elements 10R, 10G and 10B, in which luminance reductionoccurs due to electric current, such as an organic EL element, life ofthe self-luminous element is lengthened with decrease in density of anelectric current flowing through the self-luminous elements 10R, 10G and10B. Moreover, since a level of luminance reduction with emission timeis varied depending on emission colors, in the case that therespective-color emission regions 11B, 11G and 11B are assumed to havethe same area, luminance balance between emission colors is disruptedwith a lapse of time, causing change in chromaticity of white or anintermediate color.

Therefore, improvement in life of the self-luminous element 10B may beachieved by increasing the width L_(ELB) of the emission region 11B of acolor having a short life (specifically, blue). Furthermore, a drivecondition such as current density is adjusted for each color, therebyluminance reduction with emission time may be adjusted to beapproximately even between all colors, leading to suppression oftemporal change in chromaticity of white or an intermediate color.

However, in the case that dimensions of the emission regions 11R, 11Gand 11B are varied depending on emission colors in this way, a ratio ofarea of the light blocked region L_(SR), L_(SG) or L_(SB) caused by thelight blocking film 22 to area of the emission region 11R, 11G or 11B isalso varied depending on emission colors. Therefore, luminance reductiondue to the light blocking film 22 becomes uneven between the colors,resulting in disruption of white balance, and consequently chromaticityof white or an intermediate color may be changed depending on viewangles.

Therefore, in the calculation example 2, the clearance,½(L_(BMB)−L_(ELB)), of the blue self-luminous element 10B having a largewidth of the emission region 11B is smaller than the clearances,½(L_(BMR)−L_(ELR)) and ½(L_(BMG)−L_(ELG)), of the red and greenself-luminous elements 10R and 10G. Thus, each of luminance reductionwith emission time and luminance reduction caused by light blocking ofthe light blocking film 22 may be adjusted to be approximately evenbetween all colors, leading to suppression of change in chromaticitydepending on view angles of white or an intermediate color.

FIG. 10 shows a calculation result of a chromaticity-to-view anglecharacteristic Δu′v′ in the calculation example 2. In such calculation,it is assumed that the first and second substrates 11 and 21 areattached to each other with an intermediate layer 30 including resinhaving a thickness of 20 μm and a refractive index of 1.5.

As a comparative example 2, the chromaticity-to-view anglecharacteristic Δu′v′ is calculated in the same way as in the calculationexample 2 even in the case that the clearances, ½(L_(BM)−L_(EL)), areassumed to be the same (5 μm) between all colors as shown in FIG. 11. Aresult of such calculation is collectively shown in FIG. 10.

As known from FIG. 10, in the calculation example 2, the amount ofchange in chromaticity Δu′v′ from chromaticity at a view angle θ° isreduced compared with that in the comparative example 2 in view anglesof at least 30 degrees at which light blocking begins to occur by thelight blocking film 22, showing improvement in chromaticity-to-viewangle characteristic.

While description has been made on a case where the clearance,½(L_(BM)−L_(EL)), in a horizontal direction in a display plane is varieddepending on emission colors in the description of the principle and thecalculation examples 1 and 2, a clearance in a vertical direction in adisplay plane may be varied depending on emission colors. Furthermore,both the clearances in the horizontal and vertical directions in adisplay plane may be varied depending on emission colors. However, asshown in FIG. 2, influence of light blocking of the light blocking film22 is large in the horizontal direction, in which widths of the emissionregions 11R, 11G and 11B are small, and small in the vertical directionin the pixel 10 having the emission regions 11R, 11G and 11B beingelongated in the vertical direction in a display plane. Therefore, asufficient effect is obtained even in the case that only the clearancein the horizontal direction, in which the influence of light blocking islarge, is varied depending on emission colors.

In the description of the principle and the calculation examples 1 and2, description has been made on a case where the width L_(ELB) or theclearance, ½(L_(BMB)−L_(ELB)), of the blue emission region 11B is madedifferent from the widths L_(ELR) and L_(ELG), or the clearances,½(L_(BMR)−L_(ELR)) and ½(L_(BMG)−L_(ELG)), of the red and green emissionregions 11R and 11G. However, the width L_(ELR) or the clearance,½(L_(BMR)−L_(ELR)), of the red emission region 11R may be made differentfrom the widths L_(ELG) and L_(ELB), or the clearances,½(L_(BMG)−L_(ELG)) and ½(L_(BMB)−L_(ELB)), of the green and blueemission regions 11G and 11B. Alternatively, the width L_(ELG) or theclearance, ½(L_(BMG)−L_(ELG)), of the green emission region 11G may bemade different from the widths L_(ELR) and L_(ELB), or the clearances,½(L_(BMR)−L_(ELR)) and ½(L_(BMB)−L_(ELB)), of the red and blue emissionregions 11R and 11B. However, since the blue self-luminous element 10Bhas a short life compared with other color elements, the width L_(ELB)or the clearance, ½(L_(BMB)−L_(ELB)), of the blue emission region 11B ispreferably made different from the widths L_(ELR) and L_(ELG), or theclearances, ½(L_(BMR)−L_(ELR)) and ½(L_(BMG)−L_(ELG)), of the red andgreen emission regions 11R and 11G.

Furthermore, all the widths L_(ELR), L_(ELG) and L_(ELB), or theclearances ½(L_(BMG)−L_(ELR)), ½(L_(BMG)−L_(ELG)) and ½(L_(BMB)−L_(ELB))of the red, green and blue emission regions 11R, 11G and 11B may be madedifferent from one another.

FIG. 12 shows an example of the display device 1. The display device 1is used as an organic EL television apparatus having organic EL elementsas the self-luminous elements 10R, 10G and 10B, and has, for example, asignal line drive circuit 120 and a scan line drive circuit 130 asdrivers for video display around a display region 110.

A pixel drive circuit 140 is provided in the display region 110. FIG. 13shows an example of a configuration of the pixel drive circuit 140. Thepixel drive circuit 140 is an active drive circuit formed under a lowerelectrode 14 described later. Specifically, the pixel drive circuit 140includes a drive transistor Tr1 and a write transistor Tr2, a capacitor(retentive capacity) Cs between the transistors Tr1 and Tr2, and anorganic EL element 10R (10G or 10B) connected in series to the drivetransistor Tr1 between a first power line (Vcc) and a second power line(GND). The drive transistor Tr1 and the write transistor Tr2 areconfigured of a typical thin film transistor (TFT) each, and a structureof the transistor may be an inverted staggered structure (bottom gatetype) or a staggered structure (top gate type), namely, the structure isnot particularly limited.

In the pixel drive circuit 140, a plurality of signal lines 120A arearranged in a column direction, and a plurality of scan lines 130A arearranged in a row direction. An intersection of each signal line 120Aand each scan line 130A corresponds to one of the organic EL elements10R, 10G and 10B (sub pixel). Each signal line 120A is connected to thesignal line drive circuit 120, and an image signal is supplied from thesignal line drive circuit 120 to a source electrode of each writetransistor Tr2 via a signal line 120A. Each scan line 130A is connectedto the scan line drive circuit 130, and a scan signal is sequentiallysupplied from the scan line drive circuit 130 to a gate electrode ofeach write transistor Tr2 via the scan line 130A.

FIG. 14 shows a sectional configuration of the self-luminous elements10R, 10G and 10B. Each of the self-luminous elements 10R, 10G and 10B isan organic EL element in which the drive transistor Tr1 of the pixeldrive circuit 140, a planarization insulating film 13, the lowerelectrode 14 as an anode, an inter-electrode insulating film 15, anorganic layer 16 including a light emitting layer 16C described later,and an upper electrode 17 as a cathode are stacked in this order from afirst substrate 11 side. The drive transistor Tr1 is electricallyconnected to the lower electrode 14 via a connection hole 13A providedin the planarization insulating film 13.

Such self-luminous elements 10R, 10G and 10B are covered with aprotective layer 31, and sealed by attaching the second substrate 21over the whole surface of the protective layer 31 with an adhesion layer32 in between. The protective layer 31 is configured of silicon nitride(SiN_(x)), silicon oxide, a metal oxide or the like. The adhesion layer32 is configured of, for example, thermosetting resin or ultravioletcuring resin. The protective layer 31 and the adhesion layer 32configure the intermediate layer 30.

The planarization insulating film 13, which planarizes a surface of thefirst substrate 11 having the pixel drive circuit 140 formed thereon, ispreferably configured of a material being high in pattern accuracybecause fine connection holes 13A are to be formed in the film 13. As amaterial of the planarization insulating film 13, for example, anorganic material such as polyimide, or an inorganic material such assilicon oxide (SiO₂) is listed.

The lower electrode 14 acts even as a reflective layer, and desirablyhas a high reflectance to the utmost for improving luminous efficiency.In particular, when the lower electrode 14 is used as an anode, theelectrode 14 is desirably configured of a material having a highhole-injection performance. For example, such a lower electrode 14 has athickness in a stacking direction (hereinafter, simply called thickness)of 100 nm to 1000 nm both inclusive, and includes a simple substance oran alloy of a metal element such as chromium (Cr), gold (Au), platinum(Pt), nickel (Ni), copper (Cu), tungsten (W) or silver (Ag). Atransparent conductive film including indium-tin oxide (ITO) or the likemay be provided on a surface of the lower electrode 14. Even a materialsuch as an aluminum (Al) alloy, which has an undesirable hole injectionbarrier due to existence of a surface oxide film or a work functionbeing not large while having a high reflectance, may be used as thelower electrode 14 by providing an appropriate hole injection layer.

The inter-electrode insulating film 15, which ensures isolation betweenthe lower electrode 14 and the upper electrode 17, and makes theemission regions 11R, 11G and 11B to be into a desired shape, isconfigured of, for example, photosensitive resin. The inter-electrodeinsulating film 15 is provided only in the periphery of each lowerelectrode 14, and regions of the lower electrode 14 exposed from theinter-electrode insulating film 15 correspond to the emission regions11R, 11G and 11B. While the organic layer 16 and the upper electrode 17are provided on the inter-electrode insulating film 15, light emissionoccurs only in the emission regions 11R, 11G and 11B.

The organic layer 16 has, for example, a configuration in which a holeinjection layer 16A, a hole transport layer 16B, a light emitting layer16C, an electron transport layer 16D and an electron injection layer 16Eare stacked in this order from a lower electrode 14 side. Among them,layers other than the light emitting layer 16C may be provided asnecessary. The organic layer 16 may be different in configurationdepending on emission colors of the self-luminous elements 10R, 10G and10B. The hole injection layer 16A improves hole injection efficiency,and besides acts as a buffer layer for preventing current leakage. Thehole transport layer 16B improves efficiency of hole transport to thelight emitting layer 16C. The light emitting layer 16C emits lightthrough recombination of electrons and holes in response to an appliedelectric field. The electron transport layer 16D improves efficiency ofelectron transport to the light emitting layer 16C. The electroninjection layer 16E improves electron injection efficiency.

For example, the hole injection layer 16A of the self-luminous element10R has a thickness of 5 nm to 300 nm both inclusive, and is configuredof a hexaazatriphenylene derivative shown in a chemical formula 1 or 2.For example, the hole transport layer 16B of the self-luminous element10R has a thickness of 5 nm to 300 nm both inclusive, and is configuredof bis[(N-naphtyl)-N-phenyl]benzidine (α-NPD). For example, the lightemitting layer 16C of the self-luminous element 10R has a thickness of10 nm to 100 nm both inclusive, and is configured of8-quinolinol/aluminum complex (Alq₃) mixed with2,6-bis[4-[N-(4-methoxyphenye-N-phenyl]aminostyril]naphthalene-1,5-dicarbonitrile(BSN-BCN) of 40 percent by volume. For example, an electron transportlayer 16D of the self-luminous element 10R has a thickness of 5 nm to300 nm both inclusive, and is configured of Alq₃. For example, anelectron injection layer 16E of the self-luminous element 10R has athickness of about 0.3 nm, and is configured of LiF or Li₂O.

In the chemical formula 1, R1 to R6 represent substituent groupsrespectively selected from hydrogen, halogen, a hydroxyl group, an aminogroup, an arylamino group, a substituted or non-substituted carbonylgroup having a carbon number of 20 or less, a substituted ornon-substituted carbonyl ester group having a carbon number of 20 orless, a substituted or non-substituted alkyl group having a carbonnumber of 20 or less, a substituted or non-substituted alkenyl grouphaving a carbon number of 20 or less, a substituted or non-substitutedalkoxyl group having a carbon number of 20 or less, a substituted ornon-substituted aryl group having a carbon number of 30 or less, asubstituted or non-substituted heterocyclic-group having a carbon numberof 30 or less, a nitrile group, a cyano group, a nitro group, or a silylgroup; and adjacent Rm (m=1 to 6) may be bonded to each other through acyclic structure. X1 to X6 each represent a carbon or nitrogen atom.

Specifically, the hole injection layer 16A of the self-luminous element10R is preferably configured of a material shown in the chemical formula2.

For example, a hole injection layer 16A of the self-luminous element 10Ghas a thickness of 5 nm to 300 nm both inclusive, and is configured of ahexaazatriphenylene derivative shown in the chemical formula 1 or 2. Forexample, a hole transport layer 16B of the self-luminous element 10G hasa thickness of 5 nm to 300 nm both inclusive, and is configured ofα-NPD. For example, a light emitting layer 16C of the self-luminouselement 10G has a thickness of 10 nm to 100 nm both inclusive, and isconfigured of Alq₃ mixed with coumarin 6 of 1 percent by volume. Forexample, an electron transport layer 16D of the self-luminous element10G has a thickness of 5 nm to 300 nm both inclusive, and is configuredof Alq₃. For example, an electron injection layer 16E of theself-luminous element 10G has a thickness of about 0.3 nm, and isconfigured of LiF or Li₂O.

For example, a hole injection layer 16A of the self-luminous element 10Bhas a thickness of 5 nm to 300 nm both inclusive, and is configured of ahexaazatriphenylene derivative shown in the chemical formula 1 or 2. Forexample, a hole transport layer 16B of the self-luminous element 10B hasa thickness of 5 nm to 300 nm both inclusive, and is configured ofα-NPD. For example, a light emitting layer 16C of the self-luminouselement 10B has a thickness of 10 nm to 100 nm both inclusive, and isconfigured of spiro 60. For example, an electron transport layer 16D ofthe self-luminous element 10B has a thickness of 5 nm to 300 nm bothinclusive, and is configured of Alq₃. For example, an electron injectionlayer 16E of the self-luminous element 10G has a thickness of about 0.3nm, and is configured of LiF or Li₂O.

For example, the upper electrode 17 has a thickness of about 10 nm, andis configured of an alloy of aluminum (Al), magnesium (Mg), calcium (Ca)or sodium (Na). In particular, an alloy of magnesium and silver (Mg—Agalloy) is preferable because the alloy has both certain conductivity andsmall light absorbance in a form of a thin film. While a ratio ofmagnesium to silver of the Mg—Ag alloy is not particularly limited, theratio is desirably in a range of Mg:Ag=20:1 to 1:1 in thickness.Alternatively, the material of the upper electrode 17 may be an alloy ofaluminum (Al) and lithium (Li) (Al—Li alloy).

The upper electrode 17 further acts as a semi-transmissive reflectivelayer. Specifically, the self-luminous element 10R has a resonatorstructure MC1 and thus light generated by the light emitting layer 16Cis allowed to resonate between the lower and upper electrodes 14 and 17.The resonator structure MC1 allows the light generated by the lightemitting layer 16C to resonate by an interface between the lowerelectrode 14 and the organic layer 16 as a reflective surface P1, usingan interface between the intermediate layer 18 and the electroninjection layer 16E as a semi-transmissive reflective surface P2, andthe organic layer 16 as a resonator section, and extracts the light fromthe semi-transmissive reflective surface P2 side. The element 10R hasthe resonator structure MC1 in this way, causing multiple interferenceof light generated by the light emitting layer 16C, which decreases halfvalue width of a spectrum of light extracted from the semi-transmissivereflective surface P2 side, and consequently peak intensity of the lightmay be increased. That is, light radiation intensity may be increased ina front direction, leading to improvement in color purity of emissionlight. In addition, outside light entering from the second substrate 21side may be attenuated through such multiple interference, and thereforereflectance of outside light may be extremely reduced in theself-luminous elements 10R, 10G and 10B through a combined effect of theresonator structure and the color filter 23.

To achieve this, an optical distance L1 between the reflective surfaceP1 and the semi-transmissive reflective surface P2 preferably satisfiesnumerical expression 9.

(2L1)/λ+Φ/(2π)=m  Numerical expression 9

In the numerical expression 9, L1 represents an optical distance betweenthe reflective surface P1 and the semi-transmissive reflective surfaceP2, m represents the order (0 or a natural number), Φ represents sum(Φ=Φ1+Φ2) (rad) of phase shift Φ1 of reflected light at the reflectivesurface P1 and phase shift Φ2 of reflected light at thesemi-transmissive reflective surface P2, and λ represents a peakwavelength of a spectrum of light to be desirably extracted from thesemi-transmissive reflective surface P2 side. In the numericalexpression 9, L1 and λ need to be expressed in the same unit, forexample, nm.

Positions at which intensity of extracted light is maximized (resonantsurfaces) exist between the reflective surface P1 and thesemi-transmissive reflective surface P2. The resonant surfaces exist atm+1 places. In a condition of m=1 or more, half-value width of anemission spectrum is largest in the case that a light emitting surfaceis located in a resonant surface nearest the reflective surface P1.

The self-luminous elements 10R, 10G and 10B may be designed such thatthe semi-transmissive reflective surface P2 is not provided, and lightgenerated by the light emitting layer 16C is reflected on the reflectivesurface P1 so as to cause interference between the reflected light andthe light generated by the light emitting layer 16C, as shown in FIG. 15

In such a case, the light emitting layer 16C preferably includes aposition (interference position) at which the reflected light and thelight generated by the light emitting layer 16C intensify each otherthrough interference. The optical distance L1 between the reflectivesurface P1 and the interference position preferably satisfies numericalexpression 10.

(2L1)/λ+Φ/(2π)=m  Numerical expression 10

In the numerical expression 10, L1 represents an optical distancebetween the reflective surface P1 and the interference position, mrepresents the order (0 or a natural number), Φ represents phase shift(rad) of reflected light at the reflective surface P1, and λ representsa peak wavelength of a spectrum when light generated by the lightemitting layer 16C is emitted from an upper electrode 17 side. In thenumerical expression 10, L1 and λ need to be expressed in the same unit,for example, nm.

In self-luminous elements 10R, 10G and 10B having such a resonatorstructure MC1, or using interference between light generated by thelight emitting layer 16C and reflected light on the reflective surfaceP1, as the order m increases, dependence of luminance or chromaticity ona view angle, namely, difference in luminance or chromaticity between afront view and an oblique view tends to be increased. When an organic ELdisplay device is assumed to be used for a typical television apparatusor the like, reduction in luminance and change in chromaticity dependingon view angles are desirably small.

Only in the light of a view angle characteristic, a condition of m=0 isideal. However, thickness of the organic layer 16 is small in such acondition, which may cause adverse influence on a light emittingcharacteristic, or cause a short circuit between the lower and upperelectrodes 14 and 17. Therefore, for example, a condition of m=1 is usedso as to avoid increase in view-angle dependence of luminance orchromaticity and to suppress degradation of a light emittingcharacteristic or occurrence of a short circuit. For example, in thecase that the lower electrode 14 is configured of an aluminum alloy, andthe upper electrode 17 is configured of a Mg—Ag alloy, thickness of theorganic layer 16 of the blue self-luminous element 10B is about 190 nmin m=1 while the thickness is about 80 nm in m=0, and therefore a shortcircuit is suppressed in m=1.

Since a resonator effect or an interference effect of the resonatorstructure MC1 occurs at a different optical condition for each emissioncolor, a view angle characteristic is typically different for eachemission color. In a full-color display device, since white or anintermediate color is displayed by mixing colors of monochromatic light,such difference in monochromatic view angle characteristic betweenemission colors causes disruption of white balance, so that chromaticityof white or an intermediate color is changed depending on view angles.

As described before, the clearance, ½(L_(BMB)−L_(ELB)), of theself-luminous element 10B is different from the clearances,½(L_(BMR)−L_(ELR)) and ½(L_(BMG)−L_(ELG)), of another self-luminouselements 10R and 10G. Therefore, a level of reduction in luminance dueto light blocking of the light blocking film 22 is varied between thecolors to reduce difference in view angle characteristic between thecolors due to the resonator effect or the interference effect of theresonator structure MC1, so that change in chromaticity of white or anintermediate color depending on view angles may be suppressed.

The display device 1 may be manufactured, for example, in the followingway.

First, the pixel drive circuit 140 including the drive transistors Tr1is formed on the first substrate 11 including the above material, thenphotosensitive resin is coated over the whole surface of the substrateto form the planarization insulating film 13, and then the planarizationinsulating film 13 is patterned into a predetermined shape along withformation of the connection holes 13A through exposure and development,and then the patterned film is fired.

Next, the lower electrode 14 including the above material is formed by,for example, a sputtering method, and then the lower electrode 14 isselectively removed by wet etching so that the self-luminous elements10R, 10G and 10B are separated from one another.

Next, photosensitive resin is coated over the whole surface of the firstsubstrate 11, and then openings are provided in correspondence toemission regions by, for example, a photolithography method, and thenthe photosensitive resin is fired to form the inter-electrode insulatingfilm 15.

Then, the hole injection layer 16A, the hole transport layer 16B, thelight emitting layer 16C and the electron transport layer 16D of theorganic layer 16, each layer having the thickness and including thematerial as described before, are formed by, for example, a vacuumevaporation method.

After the organic layer 16 is formed, the upper electrode 17 having thethickness and including the material as described before is formed by,for example, a vacuum evaporation method. Thus, the self-luminouselements 10R, 10G and 10B as shown in FIG. 14 or 15 are formed.

Next, the protective layer 31 including the above material is formed onthe self-luminous elements 10R, 10G and 10B by, for example, a CVDmethod or a sputtering method.

Moreover, for example, a material of the light blocking film 22 iscoated by spin coating or the like on the second substrate 21 includingthe above material, and then the coated material is patterned by aphotolithography technique and fired so that the light blocking film 22is formed. Next, the red filter 23R, the blue filter 23B, and the greenfilter 23G are sequentially formed in the same way as in the lightblocking film 22.

Then, the adhesion layer 32 is formed on the protective layer 31, andthe second substrate 21 is attached to the protective layer via theadhesion layer 32. This is the end of manufacturing the display device 1as shown in FIGS. 12 to 15.

In the display device 1, a scan signal is supplied from the scan linedrive circuit 130 to each pixel 10 via the gate electrode of the writetransistor Tr2, and an image signal from the signal line drive circuit120 is stored into the storage capacitance Cs via the write transistorTr2. Specifically, on/off control of the drive transistor Tr1 isperformed in response to a signal stored in the storage capacitance Cs,so that a drive current Id is injected into the self-luminous elements10R, 10G and 10B, causing light emission through recombination of holesand electrons. The light is multiply reflected between the lowerelectrode 14 (reflective surface P1) and the upper electrode 17(semi-transmissive reflective surface P2), and the multiply-reflectedlight or light reflected on the lower electrode 14 (reflective surfaceP1) and light generated by the light emitting layer 16C are intensifiedby each other through interference, and then the intensified light isextracted through the upper electrode 17, the color filter 23 and thesecond substrate 21.

In this way, in the embodiment, since the clearance, ½(L_(BM)−L_(EL)),of the self-luminous element 10R (10G or 10B) of at least one emissioncolor is made different from the clearance, ½(L_(BM)−L_(EL)), of theself-luminous element of another emission color, difference in viewangle characteristic between the colors is reduced by using reduction inluminance caused by light blocking of the light blocking film 22, andconsequently view-angle dependence of chromaticity of white or anintermediate color may be reduced. This is particularly preferable forthe case where view angle characteristics of the colors are differentfrom one another, including the case where the resonator structure MC1is provided so that light generated by the light emitting layer 16C isallowed to resonate between the lower and upper electrodes 14 and 17, orthe case where light generated by the light emitting layer 16C isallowed to interfere with reflected light on the lower electrode 14.

Moreover, a contrast ratio may be improved by providing the lightblocking film 22.

Furthermore, in the case that width of the emission region 11B of theblue self-luminous element 10B having a short life is increased toextend the life, both of luminance reduction with emission time andluminance reduction caused by light blocking of the light blocking film22 may be adjusted to be approximately even between all colors, andconsequently change in chromaticity of white or an intermediate colordepending on view angles may be suppressed.

Modification 1

FIGS. 16 and 17 show planar configurations of a pixel 10 according tomodification 1. In the modification, the clearance, ½(L_(BM)−L_(EL)), iscontinuously changed within one self-luminous element 10R (10G or 10B),thereby a light blocked region Ls is gradually changed depending on viewangles so that a view angle characteristic may be finely adjusted.Except for this, the modification 1 has the same configuration,operation and effects as those in the above embodiment, and may bemanufactured in the same way as the embodiment.

While description has been made on a case where the clearance,½(L_(BM)−L_(EL)), in a horizontal direction in a display plane iscontinuously changed within one self-luminous element 10R (10G or 10B)in the modification 1, a clearance in a vertical direction in a displayplane may be continuously changed within one self-luminous element 10R(10G or 10B). Furthermore, both the clearances in the horizontal andvertical directions in a display plane may be continuously changedwithin one self-luminous element 10R (10G or 10B). However, as shown inFIG. 16 or 17, influence of light blocking of the light blocking film 22is large in the horizontal direction, in which widths of the emissionregions 11R, 11G and 11B are small, and small in the vertical directionin the pixel 10 having the emission regions 11R, 11G and 11B beingelongated in the vertical direction in a display plane. Therefore, asufficient effect is obtained even in the case that only the clearancein the horizontal direction, in which the influence of light blocking islarge, is continuously changed within one self-luminous element 10R (10Gor 10B).

MODULE AND APPLICATION EXAMPLES

Next, application examples of the display device described in theembodiment are described. The display device according to the embodimentmay be applied to display devices of electronic devices in any field,each of the display devices displaying an externally inputted videosignal or an internally generated video signal as an image or a videopicture, including a television apparatus, a digital camera, a notebookpersonal computer, a mobile terminal such as mobile phone, and a videocamera.

Module

The display device according to the embodiment may be built in variouselectronic devices such as application examples 1 to 5 described later,for example, as a module as shown in FIG. 18. For example, the module isformed such that a region 210 exposed from the second substrate 21 andthe adhesion layer 32 is provided in one side of the first substrate 11,and external connection terminals (not shown) are formed on the exposedregion 210 by extending lines of the signal line drive circuit 120 andthe scan line drive circuit 130. The external connection terminals maybe provided with a flexible printed circuit (FPC) 220 for input andoutput of signals.

Application Example 1

FIG. 19 shows appearance of a television apparatus using the displaydevice according to the embodiment. The television apparatus has, forexample, a front panel 310 and a video display screen 300 includingfilter glass 320, and the video display screen 300 is configured of thedisplay device according to the embodiment.

Application Example 2

FIGS. 20A and 20B show appearance of a digital camera using the displaydevice according to the embodiment. The digital camera has, for example,a light emitting section for flash 410, a display 420, a menu switch 430and a shutter button 440, and the display 420 is configured of thedisplay device according to the embodiment

Application Example 3

FIG. 21 shows appearance of a notebook personal computer using thedisplay device according to the embodiment. The notebook personalcomputer has, for example, a body 510, a keyboard 520 for inputoperation of letters and the like, and a display 530 for displayingimages, and the display 530 is configured of the display deviceaccording to the embodiment.

Application Example 4

FIG. 22 shows appearance of a video camera using the display deviceaccording to the embodiment. The video camera has, for example, a body610, a lens 620 for shooting an object provided on a front side-face ofthe body 610, and a start/stop switch 630 used in shooting, and adisplay 640. The display 640 is configured of the display deviceaccording to the embodiment.

Application Example 5

FIGS. 23A to 23G show appearance of a mobile phone using the displaydevice according to the embodiment. For example, the mobile phone isformed by connecting an upper housing 710 to a lower housing 720 by ahinge 730, and has a display 740, a sub display 750, a picture light760, and a camera 770. The display 740 or the sub display 750 isconfigured of the display device according to the embodiment.

While the application has been described with the embodiment, theapplication is not limited to the embodiment, and may be variouslymodified or altered. For example, the material and the thickness of eachlayer, or the deposition method and the deposition condition thereofdescribed in the embodiment are not limitative, and other materials andother thickness, or other deposition methods and other depositionconditions may be used.

Moreover, while description has been made with the specificconfiguration of the self-luminous elements 10R, 10G and 10B in theembodiment, not all layers in the configuration need not to be provided,or another layer may be additionally provided.

Furthermore, while description has been made on the case of anactive-matrix display device in the embodiment, the application may beapplied to a passive-matrix display device. In addition, a configurationof a pixel drive circuit for active matrix drive is not limited to theconfiguration described in the embodiment, and may be added with acapacitance element or a transistor as necessary. In such a case, adrive circuit to be necessary may be added in addition to the signalline drive circuit 120 and the scan line drive circuit 130 in accordancewith modification of the pixel drive circuit.

It should be understood that various changes and modifications to thepresently preferred embodiments described herein will be apparent tothose skilled in the art. Such changes and modifications can be madewithout departing from the spirit and scope of the present subjectmatter and without diminishing its intended advantages. It is thereforeintended that such changes and modifications be covered by the appendedclaims.

The invention is claimed as follows:
 1. A display device comprising: apair of opposed substrates; a light blocking layer provided over onesubstrate of the pair of substrates while having a plurality ofopenings; and a plurality of self-luminous elements provided on theother substrate of the pair of substrates, each of the self-luminouselements having an emission region facing each of the openings, andhaving an emission color different from an emission color of anotherelement, at least one self-luminous element being different from otherself-luminous elements in clearance in a display plane direction from anend of the emission region to an opening of the light blocking layer,such that a first clearance around a first pixel is different from asecond clearance around a second pixel.
 2. The display device accordingto claim 1, wherein a dimension in a vertical direction in a displayplane of the emission region is larger than a dimension in a horizontaldirection in the display plane of the emission region, and the clearanceis a distance in the horizontal direction in the display plane.
 3. Thedisplay device according to claim 2, wherein the one self-luminouselement is large in the dimension in the horizontal direction in thedisplay plane of the emission region, and small in the clearancecompared with the self-luminous elements other than the oneself-luminous element.
 4. The display device according to claim 1,wherein the clearance is continuously changed within the oneself-luminous element.
 5. The display device according to claim 1,wherein color filters are provided in the openings of the light blockinglayer, respectively.